Invention Grant
- Patent Title: Photosensitive negative resin composition, fine structure, production process of fine structure and liquid ejection head
- Patent Title (中): 感光负树脂组合物，结构精细，生产过程精细结构和液体喷头
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Application No.: US14360401Application Date: 2013-01-25
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Publication No.: US09268222B2Publication Date: 2016-02-23
- Inventor: Hyou Takahashi , Kyosuke Nagaoka , Masako Shimomura
- Applicant: CANON KABUSHIKI KAISHA
- Applicant Address: JP Tokyo
- Assignee: Canon Kabushiki Kaisha
- Current Assignee: Canon Kabushiki Kaisha
- Current Assignee Address: JP Tokyo
- Agency: Fitzpatrick, Cella, Harper & Scinto
- Priority: JP2012-018673 20120131
- International Application: PCT/JP2013/052427 WO 20130125
- International Announcement: WO2013/115393 WO 20130808
- Main IPC: G03F7/004
- IPC: G03F7/004 ; G03F7/027 ; G03F7/038 ; G03F7/075 ; B41J2/14
Abstract:
A photosensitive negative resin composition containing a resin (a) having at least three cyclohexene oxide skeletons in its molecule, an onium salt (b) composed of a cation moiety structure represented by the formula b1 defined in the description and an anion moiety structure represented by the formula b2 defined in the description, a silane compound (c) and an organic solvent (d). A fine structure using the resin composition, a production process of the fine structure and a liquid ejection head.
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