The present invention provides an exposure apparatus which transfers a pattern of a mask to a substrate, including a measurement unit configured to measure, at a first measurement point and a second measurement point, a height of a measurement target portion in a shot region of the substrate held by a stage, and a control unit configured to move the stage in a direction of height of the substrate based on a correction result of correcting, by a set correction value, a measured height of the measurement target portion at the first measurement point in a acceleration period of the stage, and when a measured height of the measurement target portion at the second measurement point in the constant speed period of the stage deviates from an allowable range, obtain a new correction value instead of the set correction value.