Invention Grant
US09269532B2 Charged particle beam writing apparatus, and method for detecting irregularities in dose of charged particle beam
有权
带电粒子束写入装置,以及用于检测带电粒子束的剂量不均匀的方法
- Patent Title: Charged particle beam writing apparatus, and method for detecting irregularities in dose of charged particle beam
- Patent Title (中): 带电粒子束写入装置,以及用于检测带电粒子束的剂量不均匀的方法
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Application No.: US14709200Application Date: 2015-05-11
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Publication No.: US09269532B2Publication Date: 2016-02-23
- Inventor: Hironori Mizoguchi , Hideo Inoue
- Applicant: NUFLARE TECHNOLOGY, INC.
- Applicant Address: JP Kanagawa
- Assignee: NUFLARE TECHNOLOGY, INC.
- Current Assignee: NUFLARE TECHNOLOGY, INC.
- Current Assignee Address: JP Kanagawa
- Agency: Patterson & Sheridan LLP.
- Priority: JP2014-099012 20140512
- Main IPC: G21K5/04
- IPC: G21K5/04 ; H01J37/244 ; H01J37/317

Abstract:
A charged particle beam writing apparatus includes a first limiting aperture member, in which a first opening is formed, to block a charged particle beam having been blanking-controlled to be beam “off”, and to let a part of the charged particle beam having been blanking-controlled to be beam “on” pass through the first opening, a first detector to detect a first electron amount irradiating the first limiting aperture member, in a state where beam “on” and beam “off” are repeated, a first integration processing unit to generate a first integrated signal by integrating components in a band sufficiently lower than a band of a repetition cycle of beam “on” and beam “off”, in a first detected signal detected for obtaining the first electron amount, and a first irregularity detection unit to detect irregularity in a dose amount of the charged particle beam by using the first integrated signal.
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