The present general inventive concept discloses a ceramic composite substrate that, with proper construction and proper excitation, can generate uniform plasma throughout the substrate for fluid flow treatment to influence a change in its chemical, electrical or physical properties, and method for generating plasma throughout the substrate. The ceramic substrate can include fibrous or sintered semiconducting material, and can include optional structural fiber for support of the semiconducting materials, as well as an optional auxiliary thermal heating source for cleaning excess particulate matter.