Invention Grant
- Patent Title: Liquid ejecting apparatus and method for pressurizing and depressurizing
- Patent Title (中): 液体喷射装置和加压和减压方法
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Application No.: US14491153Application Date: 2014-09-19
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Publication No.: US09272526B2Publication Date: 2016-03-01
- Inventor: Masaaki Ando
- Applicant: SEIKO EPSON CORPORATION
- Applicant Address: JP Tokyo
- Assignee: Seiko Epson Corporation
- Current Assignee: Seiko Epson Corporation
- Current Assignee Address: JP Tokyo
- Agency: Global IP Counselors, LLP
- Priority: JP2013-194738 20130920
- Main IPC: B41J2/19
- IPC: B41J2/19 ; B41J2/175 ; B41J2/18 ; B41J29/38

Abstract:
A degassing process where gas is removed by depressurizing a liquid to be less than atmospheric pressure and a pressurizing process where the liquid is pressurized to be more than the atmospheric pressure are executed at a low cost and taking up less space. There is provided a head configured to eject a liquid from a nozzle, a supply section configured to supply the liquid to the head and including a degassing section in which the liquid supplied to the head is depressurized to be less than atmospheric pressure, and a pressurizing section in which the liquid is pressurized to be more than the atmospheric pressure, and a single pump having an action of depressurizing the degassing section and an action of pressurizing the pressurizing section.
Public/Granted literature
- US20150085033A1 LIQUID EJECTING APPARATUS AND METHOD FOR PRESSURIZING AND DEPRESSURIZING Public/Granted day:2015-03-26
Information query
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