Invention Grant
US09272554B2 Image processing device, dither mask generation method, and program
有权
图像处理装置，抖动掩码生成方法和程序
- Patent Title: Image processing device, dither mask generation method, and program
- Patent Title (中): 图像处理装置，抖动掩码生成方法和程序
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Application No.: US14606124Application Date: 2015-01-27
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Publication No.: US09272554B2Publication Date: 2016-03-01
- Inventor: Takuma Hayashi
- Applicant: SEIKO EPSON CORPORATION
- Applicant Address: JP Tokyo
- Assignee: Seiko Epson Corporation
- Current Assignee: Seiko Epson Corporation
- Current Assignee Address: JP Tokyo
- Agency: Global IP Counselors, LLP
- Priority: JP2014-014092 20140129
- Main IPC: B41J2/205
- IPC: B41J2/205 ; B41J29/393 ; B41J2/21 ; G06K15/10
Abstract:
An image processing device includes a storing section configured to store a predetermined dither mask, a defective nozzle detecting section configured to detect a defective nozzle, and an interpolation processing section configured to specify a mask position corresponding to a position of the detected defective nozzle among mask positions included in the dither mask, and alter a threshold of a predetermined mask position so that a dot of the predetermined mask position included in the dither mask becomes ON when a dot of the specified mask position is ON.
Public/Granted literature
- US20150210100A1 IMAGE PROCESSING DEVICE, DITHER MASK GENERATION METHOD, AND PROGRAM Public/Granted day:2015-07-30
Information query
IPC分类:
