Invention Grant
- Patent Title: Method for electrodepositing copper nanoparticles
- Patent Title (中): 电沉积铜纳米粒子的方法
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Application No.: US13761693Application Date: 2013-02-07
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Publication No.: US09272903B2Publication Date: 2016-03-01
- Inventor: Chia-Jung Yang , Fu-Hsing Lu
- Applicant: NATIONAL CHUNG HSING UNIVERSITY
- Applicant Address: TW Taichung
- Assignee: NATIONAL CHUNG HSING UNIVERSITY
- Current Assignee: NATIONAL CHUNG HSING UNIVERSITY
- Current Assignee Address: TW Taichung
- Agency: Muncy, Geissler, Olds & Lowe, P.C.
- Main IPC: B82Y40/00
- IPC: B82Y40/00 ; B82Y30/00 ; C25D3/38 ; C25D5/18 ; C25D17/10

Abstract:
A method for electrodepositing copper nanoparticles includes the steps of a) providing a reaction system having an electrolyte solution, a conductive nitride film used as a working electrode and immersed in the electrolyte solution, a copper metal or a copper alloy used as an auxiliary electrode and immersed in the electrolyte solution, and a reference electrode immersed in the electrolyte solution; and b) applying a pulse voltage to the reaction system to form copper nanoparticles on a surface of the conductive nitride film.
Public/Granted literature
- US20140138251A1 METHOD FOR ELECTRODEPOSITING COPPER NANOPARTICLES Public/Granted day:2014-05-22
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