Invention Grant
- Patent Title: Synthetic amorphous silica powder and method for producing same
- Patent Title (中): 合成无定形二氧化硅粉末及其制造方法
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Application No.: US13520798Application Date: 2010-12-24
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Publication No.: US09272918B2Publication Date: 2016-03-01
- Inventor: Toshiaki Ueda
- Applicant: Toshiaki Ueda
- Applicant Address: JP Tokyo
- Assignee: MITSUBISHI MATERIALS CORPORATION
- Current Assignee: MITSUBISHI MATERIALS CORPORATION
- Current Assignee Address: JP Tokyo
- Agency: Locke Lord LLP
- Agent James E. Armstrong, IV; Nicholas J. DiCeglie, Jr.
- Priority: JP2010-001788 20100107
- International Application: PCT/JP2010/073287 WO 20101224
- International Announcement: WO2011/083697 WO 20110714
- Main IPC: C01B33/12
- IPC: C01B33/12 ; C01B33/18 ; C01B33/14 ; C03C3/06 ; C03B19/10

Abstract:
The synthetic amorphous silica powder of the present invention is characterized in that it comprises a synthetic amorphous silica powder obtained by applying a spheroidizing treatment to a silica powder, and by subsequently cleaning and drying it so that the synthetic amorphous silica powder has an average particle diameter D50 of 10 to 2,000 μm; wherein the synthetic amorphous silica powder has: a quotient of 1.00 to 1.35 obtained by dividing a BET specific surface area of the powder by a theoretical specific surface area calculated from the average particle diameter D50; a real density of 2.10 to 2.20 g/cm3; an intra-particulate porosity of 0 to 0.05; a circularity of 0.75 to 1.00; and a spheroidization ratio of 0.55 to 1.00.
Public/Granted literature
- US20120321894A1 SYNTHETIC AMORPHOUS SILICA POWDER AND METHOD FOR PRODUCING SAME Public/Granted day:2012-12-20
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