Invention Grant
US09273846B1 Apparatus for producing patterned illumination including at least one array of light sources and at least one array of microlenses
有权
用于产生包括至少一个光源阵列和至少一个微透镜阵列的图案照明的装置
- Patent Title: Apparatus for producing patterned illumination including at least one array of light sources and at least one array of microlenses
- Patent Title (中): 用于产生包括至少一个光源阵列和至少一个微透镜阵列的图案照明的装置
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Application No.: US14608408Application Date: 2015-01-29
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Publication No.: US09273846B1Publication Date: 2016-03-01
- Inventor: Markus Rossi , Hans Peter Herzig , Philipp Müller , Ali Naqavi , Daniel Infante Gómez , Moshe Doron , Matthias Gloor , Alireza Yasan
- Applicant: Heptagon Micro Optics Pte. Ltd.
- Applicant Address: SG Singapore
- Assignee: Heptagon Micro Optics Pte. Ltd.
- Current Assignee: Heptagon Micro Optics Pte. Ltd.
- Current Assignee Address: SG Singapore
- Agency: Fish & Richardson P.C.
- Main IPC: F21V5/00
- IPC: F21V5/00 ; F21V5/02 ; F21Y101/02

Abstract:
An apparatus for producing structured light comprises a first optical arrangement which comprises a microlens array comprising a multitude of transmissive or reflective microlenses which are regularly arranged at a lens pitch P and an illumination unit for illuminating the microlens array. The illumination unit comprises an array of light sources for emitting light of a wavelength L each and having an aperture each, wherein the apertures are located in a common emission plane which is located at a distance D from the microlens array. For the lens pitch P, the distance D and the wavelength L, the following equation applies P2=2LD/N, wherein N is an integer with N≧1. High-contrast high-intensity light patterns can be produced.
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