Invention Grant
- Patent Title: Salt and photoresist composition comprising the same
- Patent Title (中): 包含其的盐和光致抗蚀剂组合物
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Application No.: US14519939Application Date: 2014-10-21
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Publication No.: US09274421B2Publication Date: 2016-03-01
- Inventor: Yukako Anryu , Koji Ichikawa , Masafumi Yoshida
- Applicant: SUMITOMO CHEMICAL COMPANY, LIMITED
- Applicant Address: JP Tokyo
- Assignee: SUMITOMO CHEMICAL COMPANY, LIMITED
- Current Assignee: SUMITOMO CHEMICAL COMPANY, LIMITED
- Current Assignee Address: JP Tokyo
- Agency: Birch, Stewart, Kolasch & Birch, LLP
- Priority: JP2013-220862 20131024
- Main IPC: C07C381/12
- IPC: C07C381/12 ; G03F7/004 ; G03F7/039 ; G03F7/20

Abstract:
A salt represented by formula (I): wherein R1 and R2 independently in each occurrence represent a hydrogen atom, a hydroxy group or a C1-C12 hydrocarbon group where a methylene group can be replaced by an oxygen atom or a carbonyl group; Ar1 and Ar2 each independently represent a C6-C36 aromatic hydrocarbon group which can have a substituent or a C6-C36 heteroaromatic hydrocarbon group which can have a substituent; A− and A′− each independently represent an organic anion; and “m” and “n” independently each represent an integer of 1 to 2.
Public/Granted literature
- US20150118620A1 SALT AND PHOTORESIST COMPOSITION COMPRISING THE SAME Public/Granted day:2015-04-30
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