Invention Grant
US09274421B2 Salt and photoresist composition comprising the same 有权
包含其的盐和光致抗蚀剂组合物

Salt and photoresist composition comprising the same
Abstract:
A salt represented by formula (I): wherein R1 and R2 independently in each occurrence represent a hydrogen atom, a hydroxy group or a C1-C12 hydrocarbon group where a methylene group can be replaced by an oxygen atom or a carbonyl group; Ar1 and Ar2 each independently represent a C6-C36 aromatic hydrocarbon group which can have a substituent or a C6-C36 heteroaromatic hydrocarbon group which can have a substituent; A− and A′− each independently represent an organic anion; and “m” and “n” independently each represent an integer of 1 to 2.
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