Invention Grant
- Patent Title: Light modulator and illumination system of a microlithographic projection exposure apparatus
- Patent Title (中): 微光刻投影曝光装置的光调制器和照明系统
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Application No.: US14249730Application Date: 2014-04-10
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Publication No.: US09274434B2Publication Date: 2016-03-01
- Inventor: Armin Werber , Severin Waldis , Florian Bach
- Applicant: Carl Zeiss SMT GmbH
- Applicant Address: DE Oberkochen
- Assignee: Carl Zeiss SMT GmbH
- Current Assignee: Carl Zeiss SMT GmbH
- Current Assignee Address: DE Oberkochen
- Agency: Fish & Richardson P.C.
- Main IPC: G03B27/54
- IPC: G03B27/54 ; G03B27/72 ; G03F7/20 ; G02B26/08
Abstract:
An illumination system of a microlithographic projection exposure apparatus comprises a light modulator which includes a modulator substrate and an array of mirrors that are supported by the modulator substrate. At least some adjacent mirrors partly overlap. The light modulator further comprises a plurality of actuators that are supported by the modulator substrate and are configured to tilt the mirrors individually.
Public/Granted literature
- US20140218708A1 LIGHT MODULATOR AND ILLUMINATION SYSTEM OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS Public/Granted day:2014-08-07
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