Invention Grant
- Patent Title: Cell design
- Patent Title (中): 电池设计
-
Application No.: US13623978Application Date: 2012-09-21
-
Publication No.: US09275181B2Publication Date: 2016-03-01
- Inventor: Chia-En Huang , Yi-Hung Tsai , Chih-Chieh Chiu , Hsiao-Lan Yang , I-Han Huang , Chun-Jiun Dai , Fu-An Wu , Hong-Chen Cheng , Jung-Ping Yang , Cheng Hung Lee
- Applicant: Taiwan Semiconductor Manufacturing Company Limited
- Applicant Address: TW Hsin-Chu
- Assignee: Taiwan Semiconductor Manufacturing Company Limited
- Current Assignee: Taiwan Semiconductor Manufacturing Company Limited
- Current Assignee Address: TW Hsin-Chu
- Agency: Cooper Legal Group, LLC
- Main IPC: H01L21/70
- IPC: H01L21/70 ; G06F17/50 ; H01L27/088 ; H01L27/02 ; H01L27/11

Abstract:
One or more techniques or systems for designing a cell are provided. The cell generally includes one or more transistors, such as a pass gate transistor, a pull up transistor, or a pull down transistor, respectively associated one or more gate to gate distances. In some embodiments, a second gate to gate distance is selected based on a first gate to gate distance. For example, the first gate to gate distance and the second gate to gate distance are associated with a first transistor. In another example, the first gate to gate distance is associated with a first transistor and the second gate to gate distance is associated with a second transistor. In this manner, a cell design is provided to improve a static noise margin (SNM) or a write margin (WM) for the cell, for example.
Public/Granted literature
- US20140084374A1 CELL DESIGN Public/Granted day:2014-03-27
Information query
IPC分类: