Invention Grant
US09276034B2 Grid topography for patterned semiconductor coating that minimizes optical scatter and obscuration
有权
用于图案化半导体涂层的网格形貌，使光散射和遮蔽最小化
- Patent Title: Grid topography for patterned semiconductor coating that minimizes optical scatter and obscuration
- Patent Title (中): 用于图案化半导体涂层的网格形貌，使光散射和遮蔽最小化
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Application No.: US14246219Application Date: 2014-04-07
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Publication No.: US09276034B2Publication Date: 2016-03-01
- Inventor: William Zmek , Mark Louis Ceccorulli
- Applicant: Goodrich Corporation
- Applicant Address: US NC Charlotte
- Assignee: Goodrich Corporation
- Current Assignee: Goodrich Corporation
- Current Assignee Address: US NC Charlotte
- Agency: Carlson, Gaskey & Olds, PC
- Main IPC: H01L27/00
- IPC: H01L27/00 ; H01L27/146 ; H05K9/00
Abstract:
A surveillance device includes an electronic component and a protective surface outwardly of the electronic component. A generally transparent substrate is formed from a first material. Spaced portions of an electrically conductive coating are formed within channels in the substrate. The electrically conductive material is a semiconductor material. A method is also disclosed.
Public/Granted literature
- US20150289424A1 Grid Topography For Patterned Semiconductor Coating That Minimizes Optical Scatter And Obscuration Public/Granted day:2015-10-08
Information query
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