Invention Grant
- Patent Title: Self-rectified device, method for manufacturing the same, and applications of the same
- Patent Title (中): 自整流装置及其制造方法及其应用
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Application No.: US13928543Application Date: 2013-06-27
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Publication No.: US09276090B2Publication Date: 2016-03-01
- Inventor: Wei-Chih Chien , Dai-Ying Lee , Erh-Kun Lai , Ming-Hsiu Lee
- Applicant: MACRONIX INTERNATIONAL CO., LTD.
- Applicant Address: TW Hsinchu
- Assignee: MACRONIX INTERNATIONAL CO., LTD.
- Current Assignee: MACRONIX INTERNATIONAL CO., LTD.
- Current Assignee Address: TW Hsinchu
- Agency: McClure, Qualey & Rodack, LLP
- Main IPC: H01L27/24
- IPC: H01L27/24 ; H01L29/66 ; H01L45/00 ; H01L29/861 ; E04H17/16

Abstract:
A self-rectified device is provided, comprising a bottom electrode, a patterned dielectric layer with a contact hole formed on the bottom electrode, a memory formed at the bottom electrode and substantially aligned with the contact hole, and a top electrode formed on the bottom electrode and filling into the contact hole to contact with the memory, wherein the top electrode comprises a N+ type semiconductor material or a P+ type semiconductor material, and the memory and the top electrode produce a self-rectified property.
Public/Granted literature
- US20140203237A1 SELF-RECTIFIED DEVICE, METHOD FOR MANUFACTURING THE SAME, AND APPLICATIONS OF THE SAME Public/Granted day:2014-07-24
Information query
IPC分类: