Invention Grant
US09276090B2 Self-rectified device, method for manufacturing the same, and applications of the same 有权
自整流装置及其制造方法及其应用

Self-rectified device, method for manufacturing the same, and applications of the same
Abstract:
A self-rectified device is provided, comprising a bottom electrode, a patterned dielectric layer with a contact hole formed on the bottom electrode, a memory formed at the bottom electrode and substantially aligned with the contact hole, and a top electrode formed on the bottom electrode and filling into the contact hole to contact with the memory, wherein the top electrode comprises a N+ type semiconductor material or a P+ type semiconductor material, and the memory and the top electrode produce a self-rectified property.
Information query
Patent Agency Ranking
0/0