- Patent Title: Semiconductor photodetector and method for manufacturing the same
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Application No.: US14283503Application Date: 2014-05-21
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Publication No.: US09276162B2Publication Date: 2016-03-01
- Inventor: Nami Yasuoka , Haruhiko Kuwatsuka , Toru Uchida , Yoshihiro Yoneda
- Applicant: FUJITSU LIMITED , SUMITOMO ELECTRIC DEVICE INNOVATIONS, INC.
- Applicant Address: JP Kawasaki JP Yokohama
- Assignee: FUJITSU LIMITED,SUMITOMO ELECTRIC DEVICE INNOVATIONS, INC.
- Current Assignee: FUJITSU LIMITED,SUMITOMO ELECTRIC DEVICE INNOVATIONS, INC.
- Current Assignee Address: JP Kawasaki JP Yokohama
- Agency: Kratz, Quintos & Hanson, LLP
- Priority: JP2005-162416 20050602
- Main IPC: H01L31/18
- IPC: H01L31/18 ; H01L31/0232 ; H01L31/107 ; H01L31/0352

Abstract:
In order to improve reliability by preventing an edge breakdown in a semiconductor photodetector having a mesa structure such as a mesa APD, the semiconductor photodetector comprises a mesa structure formed on a first semiconductor layer of the first conduction type formed on a semiconductor substrate, the mesa structure including a light absorbing layer for absorbing light, an electric field buffer layer for dropping an electric field intensity, an avalanche multiplication layer for causing avalanche multiplication to occur, and a second semiconductor layer of the second conduction type, wherein the thickness of the avalanche multiplication layer at the portion in the vicinity of the side face of the mesa structure is made thinner than the thickness at the central portion of the mesa structure.
Public/Granted literature
- US20140252528A1 SEMICONDUCTOR PHOTODETECTOR AND METHOD FOR MANUFACTURING THE SAME Public/Granted day:2014-09-11
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