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US09276382B2 Quantum-size-controlled photoelectrochemical etching of semiconductor nanostructures 有权
半导体纳米结构的量子尺寸控制光电化学蚀刻

Quantum-size-controlled photoelectrochemical etching of semiconductor nanostructures
Abstract:
Quantum-size-controlled photoelectrochemical (QSC-PEC) etching provides a new route to the precision fabrication of epitaxial semiconductor nanostructures in the sub-10-nm size regime. For example, quantum dots (QDs) can be QSC-PEC-etched from epitaxial InGaN thin films using narrowband laser photoexcitation, and the QD sizes (and hence bandgaps and photoluminescence wavelengths) are determined by the photoexcitation wavelength.
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