Invention Grant
US09277209B2 Pattern position detection method, pattern position detection system, and image quality adjustment technique using the method and system 有权
图案位置检测方法,图案位置检测系统以及使用该方法和系统的图像质量调整技术

  • Patent Title: Pattern position detection method, pattern position detection system, and image quality adjustment technique using the method and system
  • Patent Title (中): 图案位置检测方法,图案位置检测系统以及使用该方法和系统的图像质量调整技术
  • Application No.: US14478101
    Application Date: 2014-09-05
  • Publication No.: US09277209B2
    Publication Date: 2016-03-01
  • Inventor: Hiroshi MuraseMasayoshi Imoto
  • Applicant: IIX INC.
  • Applicant Address: JP Tokyo
  • Assignee: IIX INC.
  • Current Assignee: IIX INC.
  • Current Assignee Address: JP Tokyo
  • Agency: Hauptman Ham, LLP
  • Main IPC: H04N17/02
  • IPC: H04N17/02 G09G3/00 G09G5/02 G09G3/36
Pattern position detection method, pattern position detection system, and image quality adjustment technique using the method and system
Abstract:
Provided is a pattern position detection method that allows detecting positions of patterns used for alignment with high accuracy. According to the pattern position detection method of the present invention, patterns are displayed on a liquid crystal panel (2) and captured by a camera (3). A black image is displayed on the liquid crystal panel (2) and captured by the camera (3) using a shutter speed or an f-number used when capturing the patterns. Based on a difference between a captured image of the patterns and a captured image of the black image, positions of images of the patterns on an imaging surface of the camera (3) are detected.
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