Invention Grant
- Patent Title: MEMS device and method of manufacturing the same
- Patent Title (中): MEMS器件及其制造方法
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Application No.: US14642031Application Date: 2015-03-09
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Publication No.: US09278850B2Publication Date: 2016-03-08
- Inventor: Takahiko Yoshizawa
- Applicant: SEIKO EPSON CORPORATION
- Applicant Address: JP Tokyo
- Assignee: SEIKO EPSON CORPORATION
- Current Assignee: SEIKO EPSON CORPORATION
- Current Assignee Address: JP Tokyo
- Agency: Oliff PLC
- Priority: JP2014-055345 20140318
- Main IPC: H01L27/14
- IPC: H01L27/14 ; B81B7/00 ; B81C1/00

Abstract:
A present MEMS device includes: a semiconductor substrate in which a trench is formed; a functional element that is provided in the trench of the semiconductor substrate and includes a connection electrode; a structural member that forms a cavity surrounding the functional element; a lid portion that includes a conductive member electrically connected to the connection electrode and covers the cavity; an insulating layer that covers the main surface of the semiconductor substrate provided with the lid portion and a semiconductor circuit element; a first electrode that penetrates the insulating layer and is electrically connected to the conductive member; a second electrode that penetrates the insulating layer and is electrically connected to the semiconductor circuit element; and wiring that is provided on a surface of the insulating layer and brings the first electrode and the second electrode into electrical connection to each other.
Public/Granted literature
- US20150266719A1 MEMS DEVICE AND METHOD OF MANUFACTURING THE SAME Public/Granted day:2015-09-24
Information query
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