Invention Grant
US09278881B2 EUV lithography member, making method, and titania-doped quartz glass
有权
EUV光刻元件，制作方法和二氧化钛掺杂石英玻璃
- Patent Title: EUV lithography member, making method, and titania-doped quartz glass
- Patent Title (中): EUV光刻元件，制作方法和二氧化钛掺杂石英玻璃
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Application No.: US14146182Application Date: 2014-01-02
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Publication No.: US09278881B2Publication Date: 2016-03-08
- Inventor: Shigeru Maida , Hisatoshi Otsuka , Tetsuji Ueda , Masanobu Ezaki
- Applicant: SHIN-ETSU CHEMICAL CO., LTD.
- Applicant Address: JP Tokyo
- Assignee: SHIN-ETSU CHEMICAL CO., LTD.
- Current Assignee: SHIN-ETSU CHEMICAL CO., LTD.
- Current Assignee Address: JP Tokyo
- Agency: Westerman, Hattori, Daniels & Adrian, LLP
- Priority: JP2013-008909 20130122
- Main IPC: C03C3/06
- IPC: C03C3/06 ; C03C10/00 ; C03C4/00 ; C03B19/14 ; C03B20/00 ; C03B25/02 ; G03F7/20 ; G03F1/60 ; G03F1/22
Abstract:
A member is made of titania-doped quartz glass in which striae have a curvature radius of at least 150 mm in a surface perpendicular to an EUV-reflecting surface. The member free of exposed striae and having a high flatness is useful in EUV lithography.
Public/Granted literature
- US20140206524A1 EUV LITHOGRAPHY MEMBER, MAKING METHOD, AND TITANIA-DOPED QUARTZ GLASS Public/Granted day:2014-07-24
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