Invention Grant
- Patent Title: Film forming apparatus and method of operating the same
- Patent Title (中): 成膜装置及其操作方法
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Application No.: US13661120Application Date: 2012-10-26
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Publication No.: US09279183B2Publication Date: 2016-03-08
- Inventor: Atsushi Endo , Satoshi Mizunaga , Takehiro Otsuka
- Applicant: TOKYO ELECTRON LIMITED
- Applicant Address: JP
- Assignee: TOKYO ELECTRON LIMITED
- Current Assignee: TOKYO ELECTRON LIMITED
- Current Assignee Address: JP
- Agency: Cantor Colburn LLP
- Priority: JP2011-236197 20111027
- Main IPC: H01L21/00
- IPC: H01L21/00 ; C23C16/44 ; H01L21/02

Abstract:
A method of operating a film forming apparatus includes forming a carbon film on each of surfaces of a plurality of objects held by a holding unit in a processing container and performing a cleaning process with a cleaning gas to remove an unnecessary carbon film adhered on a inside of the processing container, wherein the method further includes, before the forming of the carbon film, forming, on a surface of a member contacting a processing space in the processing container, a tolerant pre-coating film which has a tolerance to the cleaning gas and improves adhesion of the carbon film to the surface of the member. Accordingly, the adhesion of the carbon film is improved, and further, the tolerant pre-coating film remains even when the cleaning process of removing the unnecessary carbon film is performed.
Public/Granted literature
- US20130109196A1 FILM FORMING APPARATUS AND METHOD OF OPERATING THE SAME Public/Granted day:2013-05-02
Information query
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