Invention Grant
US09279906B2 Microstructure film 有权
微结构薄膜

Microstructure film
Abstract:
The present invention is directed to a microstructure film comprising an area of microstructures and two edge areas, wherein the height of the highest part in the edge areas exceeds the height of the highest point in the microstructures, preferably by about 1 μm to about 1 mm. The application also describes how such a film may be manufactured.
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