Invention Grant
- Patent Title: Color filter substrate and method for producing same
- Patent Title (中): 滤色器基板及其制造方法
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Application No.: US14421251Application Date: 2013-08-14
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Publication No.: US09279924B2Publication Date: 2016-03-08
- Inventor: Takafumi Kawanishi
- Applicant: Sharp Kabushiki Kaisha
- Applicant Address: JP Osaka
- Assignee: SHARP KABUSHIKI KAISHA
- Current Assignee: SHARP KABUSHIKI KAISHA
- Current Assignee Address: JP Osaka
- Agency: Chen Yoshimura LLP
- Priority: JP2012-182499 20120821
- International Application: PCT/JP2013/071900 WO 20130814
- International Announcement: WO2014/030581 WO 20140227
- Main IPC: G02B5/20
- IPC: G02B5/20 ; G02B5/22 ; G02F1/1335 ; G03F7/16 ; G03F7/30 ; G03F7/00 ; G03F7/095

Abstract:
Provided are: a color filter substrate that can improve the uniformity of thickness of color filters, and a method of manufacturing the color filter substrate. The method of manufacturing a color filter substrate includes: forming a plurality of photoresist films in layers on a transparent substrate; exposing said plurality of photoresist films via a photomask; forming a pattern having an opening by developing the plurality of photoresist films after exposure; and discharging ink into the opening. The photosensitivities of the plurality of photoresist films differ from each other.
Public/Granted literature
- US20150205019A1 COLOR FILTER SUBSTRATE AND METHOD FOR PRODUCING SAME Public/Granted day:2015-07-23
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