Invention Grant
- Patent Title: Method for manufacturing semiconductor modulator and semiconductor modulator
- Patent Title (中): 制造半导体调制器和半导体调制器的方法
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Application No.: US14229089Application Date: 2014-03-28
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Publication No.: US09280004B2Publication Date: 2016-03-08
- Inventor: Hideki Yagi , Takamitsu Kitamura , Hirohiko Kobayashi , Yoshihiro Yoneda
- Applicant: SUMITOMO ELECTRIC INDUSTRIES, LTD.
- Applicant Address: JP Osaka
- Assignee: SUMITOMO ELECTRIC INDUSTRIES, LTD.
- Current Assignee: SUMITOMO ELECTRIC INDUSTRIES, LTD.
- Current Assignee Address: JP Osaka
- Agency: Smith, Gambrell & Russell, LLP.
- Priority: JP2013-073342 20130329
- Main IPC: G02F1/025
- IPC: G02F1/025

Abstract:
A method for manufacturing a semiconductor modulator includes the steps of preparing a substrate having a main surface including first and second areas; forming a stacked semiconductor layer on the main surface; forming an optical waveguide mesa by etching the stacked semiconductor layer using a mask, the optical waveguide mesa including an optical modulation portion; applying a resin on a top surface and a side surface of the optical waveguide mesa and on the substrate; forming a first opening in the resin on the second area of the substrate; forming an underlayer structure on the second area of the substrate in contact with the substrate; and forming a pad electrode on the underlayer structure in contact with the underlayer structure through the first opening of the resin. The underlayer structure includes an insulating layer made of a dielectric material.
Public/Granted literature
- US20140294335A1 METHOD FOR MANUFACTURING SEMICONDUCTOR MODULATOR AND SEMICONDUCTOR MODULATOR Public/Granted day:2014-10-02
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