Invention Grant
US09280053B2 Apparatus for and method of temperature compensation in high power focusing system for EUV LPP source
有权
用于EUV LPP源的高功率聚焦系统的温度补偿装置和方法
- Patent Title: Apparatus for and method of temperature compensation in high power focusing system for EUV LPP source
- Patent Title (中): 用于EUV LPP源的高功率聚焦系统的温度补偿装置和方法
-
Application No.: US14017882Application Date: 2013-09-04
-
Publication No.: US09280053B2Publication Date: 2016-03-08
- Inventor: Alexander I. Ershov
- Applicant: Cymer LLC
- Applicant Address: NL Veldhoven
- Assignee: CYMER, LLC
- Current Assignee: CYMER, LLC
- Current Assignee Address: NL Veldhoven
- Agency: Arent Fox LLP
- Main IPC: G03B27/54
- IPC: G03B27/54 ; G03B27/52 ; G03F7/20

Abstract:
Apparatus for and method of temperature compensating a focusing system in having at least one transmissive optical element with a thermal lens. A reflective optical element is introduced having a thermal lens complementary to the thermal lens of the transmissive optical element so that the combined optical characteristics of the two optical elements are substantially temperature independent. Provision can also be made for a change in the absorption of the transmissive optical element over time. The focusing system is especially applicable to systems for generating EUV light for use in semiconductor photolithography.
Public/Granted literature
- US20150062544A1 APPARATUS FOR AND METHOD OF TEMPERATURE COMPENSATION IN HIGH POWER FOCUSING SYSTEM FOR EUV LPP SOURCE Public/Granted day:2015-03-05
Information query