Invention Grant
- Patent Title: Illumination system for microlithography
- Patent Title (中): 微光刻照明系统
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Application No.: US14496689Application Date: 2014-09-25
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Publication No.: US09280060B2Publication Date: 2016-03-08
- Inventor: Axel Scholz , Frank Schlesener , Nils Haverkamp , Vladimir Davydenko , Michael Gerhard , Gerhard-Wilhelm Ziegler , Mirco Kern , Thomas Bischoff , Thomas Stammler , Stephan Kellner , Manfred Maul , Daniel Walldorf , Igor Hurevich , Markus Deguenther
- Applicant: Carl Zeiss SMT GmbH
- Applicant Address: DE Oberkochen
- Assignee: Carl Zeiss SMT GmbH
- Current Assignee: Carl Zeiss SMT GmbH
- Current Assignee Address: DE Oberkochen
- Agency: Fish & Richardson P.C.
- Priority: DE102009006685 20090129
- Main IPC: G03B27/54
- IPC: G03B27/54 ; G03B27/42 ; G03F7/20
Abstract:
A raster arrangement includes first and second types of raster elements which have different bundle-influencing effects. There is a distance step between a first raster area and a second raster area. The first raster area comprises a raster element of the first raster element type. The second raster area includes a raster element of the second raster element type. The raster arrangement is configured to be used in a microlithography illumination system.
Public/Granted literature
- US20150022798A1 ILLUMINATION SYSTEM FOR MICROLITHOGRAPHY Public/Granted day:2015-01-22
Information query
