Invention Grant
- Patent Title: Exposure device
- Patent Title (中): 曝光装置
-
Application No.: US13883001Application Date: 2011-11-04
-
Publication No.: US09280062B2Publication Date: 2016-03-08
- Inventor: Duk Lee , Hidetoshi Tabata
- Applicant: Duk Lee , Hidetoshi Tabata
- Applicant Address: JP Tokyo
- Assignee: Orc Manufacturing Co., LTD.
- Current Assignee: Orc Manufacturing Co., LTD.
- Current Assignee Address: JP Tokyo
- Agency: Berenato & White, LLC
- Priority: JP2010-247129 20101104; JP2010-276738 20101213; JP2011-056637 20110315
- International Application: PCT/JP2011/075435 WO 20111104
- International Announcement: WO2012/060441 WO 20120510
- Main IPC: G03F7/20
- IPC: G03F7/20 ; H05K1/02

Abstract:
An exposure device can exposes a circuit pattern while information data is suitably changed. An exposure device comprises a first light source (20) for irradiating a first light including ultraviolet rays, a projection exposure unit (70) for exposing a circuit pattern drawn on a photomask on a substrate, with the first light, a substrate stage (60) for mounting the substrate, a housing (11) for arranging the substrate stage, a second light source (41) for irradiating a second light including ultraviolet rays, arranged at a position different from the first light source, a spatial light modulation unit (40) for exposing information data formed electrically using the second light on the substrate, and a spatial optical light modulation unit driving means (5) for moving the spatial light modulation unit arranged on the housing (11) in a direction parallel to a moving direction of the substrate stage.
Public/Granted literature
- US20130308111A1 EXPOSURE DEVICE Public/Granted day:2013-11-21
Information query
IPC分类: