Invention Grant
- Patent Title: Inspection apparatus to detect a target located within a pattern for lithography
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Application No.: US14664007Application Date: 2015-03-20
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Publication No.: US09280065B2Publication Date: 2016-03-08
- Inventor: Marcus Adrianus Van De Kerkhof
- Applicant: ASML Netherlands B.V.
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Sterne, Kessler, Goldstein & Fox P.L.L.C.
- Main IPC: G03F7/20
- IPC: G03F7/20 ; G01N21/21 ; G01N21/95 ; G01N21/956

Abstract:
A system detects targets located within patterns. It operates in the pupil plane by filtering the received signal from the surrounding pattern. A method includes illuminating a target and a surrounding pattern with radiation, detecting the radiation reflected by the target and the surrounding pattern and forming a first set of data based on the detected radiation, removing portions of the first set of data which correspond to the target to form reduced data, interpolating the remaining portions of the reduced data over the removed portions to form product data, and subtracting the product data from the first set of data to form target data.
Public/Granted literature
- US20150192858A1 Inspection Apparatus to Detect a Target Located Within a Pattern for Lithography Public/Granted day:2015-07-09
Information query
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