Invention Grant
- Patent Title: Stage apparatus, lithography apparatus and method of manufacturing article
- Patent Title (中): 舞台装置,光刻装置及其制造方法
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Application No.: US14334039Application Date: 2014-07-17
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Publication No.: US09280066B2Publication Date: 2016-03-08
- Inventor: Hiroshi Kii , Nobushige Korenaga
- Applicant: CANON KABUSHIKI KAISHA
- Applicant Address: JP Tokyo
- Assignee: CANON KABUSHIKI KAISHA
- Current Assignee: CANON KABUSHIKI KAISHA
- Current Assignee Address: JP Tokyo
- Agency: Rossi, Kimms & McDowell LLP
- Priority: JP2013-152913 20130723
- Main IPC: G03B27/58
- IPC: G03B27/58 ; G03F7/20

Abstract:
The present invention provides a stage apparatus which holds a substrate, including a first moving stage, a second moving stage supported by the first moving stage, a linear motor including a coil arranged on the first moving stage, and a magnet arranged on the second moving stage in correspondence with the coil, a first channel formed in the first moving stage to supply a first refrigerant for recovering heat from the coil not to contact the coil, a cover member arranged on the first moving stage to surround the coil and be spaced apart from the coil, and a second channel formed in the cover member to supply a second refrigerant for recovering heat from the cover member not to contact the coil.
Public/Granted literature
- US20150029484A1 STAGE APPARATUS, LITHOGRAPHY APPARATUS AND METHOD OF MANUFACTURING ARTICLE Public/Granted day:2015-01-29
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