Invention Grant
US09280066B2 Stage apparatus, lithography apparatus and method of manufacturing article 有权
舞台装置,光刻装置及其制造方法

Stage apparatus, lithography apparatus and method of manufacturing article
Abstract:
The present invention provides a stage apparatus which holds a substrate, including a first moving stage, a second moving stage supported by the first moving stage, a linear motor including a coil arranged on the first moving stage, and a magnet arranged on the second moving stage in correspondence with the coil, a first channel formed in the first moving stage to supply a first refrigerant for recovering heat from the coil not to contact the coil, a cover member arranged on the first moving stage to surround the coil and be spaced apart from the coil, and a second channel formed in the cover member to supply a second refrigerant for recovering heat from the cover member not to contact the coil.
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