Invention Grant
US09280069B2 Exposure apparatus, producing method of exposure apparatus, and producing method of microdevice
有权
曝光装置，曝光装置的制造方法以及微型装置的制造方法
- Patent Title: Exposure apparatus, producing method of exposure apparatus, and producing method of microdevice
- Patent Title (中): 曝光装置，曝光装置的制造方法以及微型装置的制造方法
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Application No.: US11661296Application Date: 2006-03-28
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Publication No.: US09280069B2Publication Date: 2016-03-08
- Inventor: Shuji Kawamura
- Applicant: Shuji Kawamura
- Applicant Address: JP Tokyo
- Assignee: NIKON CORPORATION
- Current Assignee: NIKON CORPORATION
- Current Assignee Address: JP Tokyo
- Agency: Oliff PLC
- Priority: JP2005-095225 20050329
- International Application: PCT/JP2006/306232 WO 20060328
- International Announcement: WO2006/104127 WO 20061005
- Main IPC: G03B27/44
- IPC: G03B27/44 ; G03B27/58 ; G03B27/62 ; G03F7/20
Abstract:
An exposure apparatus for exposing a pattern formed on a mask (M) onto a photosensitive substrate (P) through a projection optical system (PL), comprising an upper pedestal (26) on which at least one of the projection optical system (PL) and a mask stage (MST) which is to hold the mask (M) is mounted, and a plurality of lower pedestals (6a) which supports the upper pedestal (26) and which has a longitudinal direction in a predetermined direction.
Public/Granted literature
- US20080030702A1 Exposure Apparatus, Producing Method of Exposure Apparatus, and Producing Method of Microdevice Public/Granted day:2008-02-07
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