Invention Grant
- Patent Title: Acidic post-sputter wash for magnetic recording media
- Patent Title (中): 用于磁记录介质的酸性后溅射洗涤
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Application No.: US14673676Application Date: 2015-03-30
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Publication No.: US09280998B1Publication Date: 2016-03-08
- Inventor: Hooi In Tan , Chin Hoe Teoh
- Applicant: WD Media, LLC
- Applicant Address: US CA San Jose
- Assignee: WD Media, LLC
- Current Assignee: WD Media, LLC
- Current Assignee Address: US CA San Jose
- Main IPC: G11B5/66
- IPC: G11B5/66 ; G11B5/851 ; C23C14/58 ; G11B5/667

Abstract:
A recording medium having an outer surface relatively free of magnetic particulates is achievable by, after forming a magnetic recording layer with which magnetic contamination is associated, removing magnetic contamination from the medium by immersing the medium in an acidic water solution. For example, a post-sputter wash process utilizing a mildly acidic water solution having a pH less than around 5 may remove cobalt particle contaminants from the surface of the medium. The water solution may be acidized by introducing into deionized water a pre-diluted strong acid such as nitric acid or a weak acid such as carbonic acid.
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