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US09281225B2 Substrate processing apparatus and substrate processing method 有权
基板加工装置及基板处理方法

Substrate processing apparatus and substrate processing method
Abstract:
A substrate processing apparatus including a transfer unit for transferring, under reduced pressure, a laminate including a wafer and a support plate which are bonded to each other and supported by use of support pins that supports an inner periphery of a first surface of the wafer, the first surface being opposite to a second surface of the wafer onto which a second surface the support plate is bonded.
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