Invention Grant
- Patent Title: Field effect transistor
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Application No.: US14753681Application Date: 2015-06-29
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Publication No.: US09281412B2Publication Date: 2016-03-08
- Inventor: Yasuhiko Takemura
- Applicant: Semiconductor Energy Laboratory Co., Ltd.
- Applicant Address: JP Kanagawa-ken
- Assignee: Semiconductor Energy Laboratory Co., Ltd.
- Current Assignee: Semiconductor Energy Laboratory Co., Ltd.
- Current Assignee Address: JP Kanagawa-ken
- Agency: Robinson Intellectual Property Law Office
- Agent Eric J. Robinson
- Priority: JP2010-136705 20100616
- Main IPC: H01L29/786
- IPC: H01L29/786 ; H01L29/24 ; H01L21/02 ; H01L29/417

Abstract:
An insulating film is provided over one surface of a first semiconductor layer including a first oxide semiconductor including indium as a main component, and a second semiconductor layer including an i-type second oxide semiconductor is provided in contact with the other surface. The energy difference between a vacuum level and a Fermi level in the second oxide semiconductor is larger than that in the first oxide semiconductor. In the first semiconductor layer, a region in the vicinity of the junction surface with the second oxide semiconductor which satisfies the above condition is a region having an extremely low carrier concentration (a quasi-i-type region). By using the region as a channel, the off-state current can be reduced. Further, a drain current of the FET flows through the first oxide semiconductor having a high mobility; accordingly, a large amount of current can be extracted.
Public/Granted literature
- US20150303312A1 FIELD EFFECT TRANSISTOR Public/Granted day:2015-10-22
Information query
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