Invention Grant
- Patent Title: Method for fabricating single electron transistor
- Patent Title (中): 单电子晶体管制造方法
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Application No.: US14199505Application Date: 2014-03-06
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Publication No.: US09281484B2Publication Date: 2016-03-08
- Inventor: Jun-Hyung Kim , Young-Keun Lee , Hong You , Sung-Jae An , Tae-Hee Kim
- Applicant: SK INNOVATION CO., LTD.
- Applicant Address: KR Seoul
- Assignee: SK INNOVATION CO., LTD.
- Current Assignee: SK INNOVATION CO., LTD.
- Current Assignee Address: KR Seoul
- Agency: IP & T Group LLP
- Priority: KR10-2013-0023890 20130306; KR10-2013-0023912 20130306; KR10-2013-0023963 20130306; KR10-2013-0024077 20130306
- Main IPC: H01L51/05
- IPC: H01L51/05 ; H01L51/00

Abstract:
A transistor and a fabrication method thereof. A transistor includes a channel region including linkers, formed on a substrate, and a metallic nanoparticle grown from metal ions bonded to the linkers, a source region disposed at one end of the channel region, a drain region disposed at the other end of the channel region opposite of the source region, and a gate coupled to the channel region and serving to control migration of at least one charges in the channel region.
Public/Granted literature
- US20140252307A1 SINGLE ELECTRON TRANSISTOR AND METHOD FOR FABRICATING THE SAME Public/Granted day:2014-09-11
Information query
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