Invention Grant
- Patent Title: Exposure parameter compensation method and an imaging device
- Patent Title (中): 曝光参数补偿方法和成像装置
-
Application No.: US13221486Application Date: 2011-08-30
-
Publication No.: US09282243B2Publication Date: 2016-03-08
- Inventor: Tai-Hung Chen , Yi-Wen Tsai , Yijian Lee
- Applicant: Tai-Hung Chen , Yi-Wen Tsai , Yijian Lee
- Applicant Address: TW Taipei
- Assignee: ABILITY ENTERPRISE CO., LTD.
- Current Assignee: ABILITY ENTERPRISE CO., LTD.
- Current Assignee Address: TW Taipei
- Agency: Rabin & Berdo, P.C.
- Priority: TW100104877A 20110215
- Main IPC: H04N5/235
- IPC: H04N5/235 ; H04N5/232

Abstract:
The present invention is directed to an exposure parameter compensation method and an imaging device. A capture-mode image capturing step is performed to obtain a first image and a second image according to a first exposure time and a second exposure time respectively based on a first light sensitivity and a predetermined time. The first image and the second image are operated on to result in a difference image. The first light sensitivity is replaced with a second light sensitivity, which is then recorded.
Public/Granted literature
- US20120206622A1 EXPOSURE PARAMETER COMPENSATION METHOD AND AN IMAGING DEVICE Public/Granted day:2012-08-16
Information query