Invention Grant
US09283365B2 Patch production 有权
补丁生产

Patch production
Abstract:
A method of producing projections on a patch including providing a mask on a substrate and etching the substrate using an etchant and a passivant to thereby control the etching process and form the projections, wherein the passivant does not include oxygen.
Public/Granted literature
Information query
Patent Agency Ranking
0/0