Invention Grant
- Patent Title: Fluid handling device
- Patent Title (中): 流体处理装置
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Application No.: US14722604Application Date: 2015-05-27
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Publication No.: US09283558B2Publication Date: 2016-03-15
- Inventor: Koichi Ono , Ken Kitamoto
- Applicant: Enplas Corporation
- Applicant Address: JP Saitama
- Assignee: Enplas Corporation
- Current Assignee: Enplas Corporation
- Current Assignee Address: JP Saitama
- Agency: Brundidge & Stanger, P.C.
- Priority: JP2014-109084 20140527
- Main IPC: G01N15/06
- IPC: G01N15/06 ; G01N33/00 ; G01N33/48 ; B01L3/00

Abstract:
A fluid handling device includes a substrate, a film, and a conductive layer. The substrate includes a first through-hole, and a second through-hole. The conductive layer is disposed on one surface of the film to extend in a first area, a second area and a third area of the film. The substrate includes a first surface and a second surface facing away from the first surface. The first area is bonded to the first surface of the substrate such that a housing part is formed by closing one opening of the first through-hole, and such that a part of the conductive layer is exposed to the inside of the housing part. The second area is disposed inside the second through-hole, and the third area is bonded to the second surface of the substrate such that a part of the conductive layer is exposed to the outside.
Public/Granted literature
- US20150343441A1 FLUID HANDLING DEVICE Public/Granted day:2015-12-03
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