Invention Grant
- Patent Title: Tilt structure
- Patent Title (中): 倾斜结构
-
Application No.: US14320935Application Date: 2014-07-01
-
Publication No.: US09285522B2Publication Date: 2016-03-15
- Inventor: Takahiko Yoshizawa
- Applicant: SEIKO EPSON CORPORATION
- Applicant Address: JP Tokyo
- Assignee: SEIKO EPSON CORPORATION
- Current Assignee: SEIKO EPSON CORPORATION
- Current Assignee Address: JP Tokyo
- Agency: Oliff PLC
- Priority: JP2010-086767 20100405
- Main IPC: B32B3/00
- IPC: B32B3/00 ; G02B5/28 ; G01J3/26 ; G02B26/00 ; B81C1/00 ; G01J3/02 ; G01J3/36 ; G01J3/51
Abstract:
A tilt structure includes a shaft section formed on a substrate section, a tilt structure film having one end formed on an upper surface of the shaft section, and the other end bonded to the substrate section, and a thin film section provided to the tilt structure film, located on a corner section composed of the upper surface of the shaft section and a side surface of the shaft section, and having a film thickness thinner than the tilt structure film, the tilt structure film is bent in the thin film section, and an acute angle is formed by the substrate section and the tilt structure film.
Public/Granted literature
- US20140312213A1 TILT STRUCTURE Public/Granted day:2014-10-23
Information query
