Invention Grant
- Patent Title: Silicon nitride substrate, circuit substrate and electronic device using the same
- Patent Title (中): 氮化硅衬底,电路衬底和使用其的电子器件
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Application No.: US13522218Application Date: 2011-01-13
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Publication No.: US09293384B2Publication Date: 2016-03-22
- Inventor: Yuusaku Ishimine , Masayuki Moriyama , Kenji Komatsubara
- Applicant: Yuusaku Ishimine , Masayuki Moriyama , Kenji Komatsubara
- Applicant Address: JP Kyoto
- Assignee: KYOCERA Corporation
- Current Assignee: KYOCERA Corporation
- Current Assignee Address: JP Kyoto
- Agency: Procopio, Cory, Hargreaves & Savitch LLP
- Priority: JP2010-004619 20100113
- International Application: PCT/JP2011/050436 WO 20110113
- International Announcement: WO2011/087055 WO 20110721
- Main IPC: H01L23/15
- IPC: H01L23/15 ; H05K7/20 ; H05K1/00 ; B32B33/00 ; H01L23/13 ; H01L35/32 ; C04B35/587 ; C04B37/02 ; H05K1/03 ; H05K3/38

Abstract:
A silicon nitride substrate comprises a substrate comprising a silicon nitride sintered body, and a plurality of granular bodies containing silicon and integrated to a principal surface of the substrate, wherein a plurality of needle crystals or column crystals comprising mainly silicon nitride are extended from a portion of the granular bodies. A brazing material is applied to a principal surface of the substrate, and a circuit member and a heat radiation member are arranged on the applied brazing material, and bonded by heating. Because of a plurality of granular bodies integrated to the principal surface of the substrate, and a plurality of the needle crystals or the column crystals extended from a portion of the granular bodies, a high anchor effect is produced so that the circuit member and the heat radiation member are firmly bonded to the silicon nitride substrate.
Public/Granted literature
- US20120281362A1 SILICON NITRIDE SUBSTRATE, CIRCUIT SUBSTRATE AND ELECTRONIC DEVICE USING THE SAME Public/Granted day:2012-11-08
Information query
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