Invention Grant
- Patent Title: Method and mechanism for erosion detection of defining apertures
- Patent Title (中): 定义孔的侵蚀检测方法和机理
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Application No.: US14169488Application Date: 2014-01-31
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Publication No.: US09299534B2Publication Date: 2016-03-29
- Inventor: David Timberlake , Mark R. Amato , Nathan Roth
- Applicant: Varian Semiconductor Equipment Associates, Inc.
- Applicant Address: US MA Gloucester
- Assignee: Varian Semiconductor Equipment Associates, Inc.
- Current Assignee: Varian Semiconductor Equipment Associates, Inc.
- Current Assignee Address: US MA Gloucester
- Main IPC: G21K1/00
- IPC: G21K1/00 ; H01J37/317 ; H01J37/244

Abstract:
A defining aperture plate having at least two differently sized apertures is used in conjunction with at least two charge collectors. Because of the difference in aperture width, the two charge collectors receive different amounts of ions, where the amount is proportional to the associated aperture width. By monitoring the ratio of the charge collected by the first charge collector to the charge collected by the second collector, the amount of erosion can be monitored and optionally compensated for.
Public/Granted literature
- US20150221472A1 METHOD AND MECHANISM FOR EROSION DETECTION OF DEFINING APERTURES Public/Granted day:2015-08-06
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