Invention Grant
- Patent Title: Three-dimensional semiconductor devices with current path selection structure
- Patent Title (中): 具有电流路径选择结构的三维半导体器件
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Application No.: US14150452Application Date: 2014-01-08
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Publication No.: US09299707B2Publication Date: 2016-03-29
- Inventor: Jaeduk Lee , Youngwoo Park , Jintaek Park , Dohyun Lee , Kohji Kanamori
- Applicant: Jaeduk Lee , Youngwoo Park , Jintaek Park , Dohyun Lee , Kohji Kanamori
- Applicant Address: KR
- Assignee: Samsung Electronics Co., Ltd.
- Current Assignee: Samsung Electronics Co., Ltd.
- Current Assignee Address: KR
- Agency: Myers Bigel & Sibley, P.A.
- Priority: KR10-2013-0003278 20130111
- Main IPC: H01L27/108
- IPC: H01L27/108 ; H01L27/105 ; H01L27/115 ; G11C16/10 ; G11C16/14

Abstract:
Provided are three-dimensional semiconductor devices and methods of operating the same. The three-dimensional semiconductor devices may include active patterns arranged on a substrate to have a multi-layered and multi-column structure and drain patterns connected to respective columns of the active patterns. The methods may include a layer-selection step connecting a selected one of layers of the active patterns selectively to the drain patterns. For example, the layer-selection step may be performed in such a way that widths of depletion regions to be formed in end-portions of the active patterns are differently controlled depending on to a height from the substrate.
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