Invention Grant
US09299709B2 Semiconductor device and semiconductor memory devices having first, second, and third insulating layers
有权
具有第一,第二和第三绝缘层的半导体器件和半导体存储器件
- Patent Title: Semiconductor device and semiconductor memory devices having first, second, and third insulating layers
- Patent Title (中): 具有第一,第二和第三绝缘层的半导体器件和半导体存储器件
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Application No.: US14462766Application Date: 2014-08-19
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Publication No.: US09299709B2Publication Date: 2016-03-29
- Inventor: Takashi Sasaki
- Applicant: Micron Technology, Inc.
- Applicant Address: US ID Boise
- Assignee: Micron Technology, Inc.
- Current Assignee: Micron Technology, Inc.
- Current Assignee Address: US ID Boise
- Agency: Wells St. John, P.S.
- Priority: JP2013-184310 20130905
- Main IPC: H01L27/108
- IPC: H01L27/108 ; H01L49/02

Abstract:
Disclosed herein is a device that includes: a semiconductor substrate; a first insulating layer over a surface of the semiconductor substrate; first and second contact plugs each including side and upper surfaces, the side surfaces of the first and second contact plugs being surrounded by the first insulating film, the upper surfaces of the first and second contact plugs being substantially on the same plane with an upper surface of the first insulating layer; a second insulating layer over the first insulating layer; a first conductive layer including a bottom portion on the first contact plug and a side portion surrounded by the second insulating layer; a third insulating layer over the first conductive layer; and a second conductive layer on the second contact plug, apart of a side surface of the second conductive layer being surrounded by both the second and third insulating layers.
Public/Granted literature
- US20150060970A1 Semiconductor Device Including Contact Plugs And Conductive Layers Thereon Public/Granted day:2015-03-05
Information query
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