Invention Grant
- Patent Title: Array substrate and manufacturing method thereof as well as display panel
- Patent Title (中): 阵列基板及其制造方法以及显示面板
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Application No.: US14387885Application Date: 2013-12-09
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Publication No.: US09299727B2Publication Date: 2016-03-29
- Inventor: Jian Guo
- Applicant: BOE TECHNOLOGY GROUP CO., LTD. , BEIJING BOE OPTOELECTRONICS TECHNOLOGY CO., LTD.
- Applicant Address: CN Beijing CN Beijing
- Assignee: BOE Technology Group Co., Ltd.,Beijing BOE Optoelectronics Technology Co., Ltd.
- Current Assignee: BOE Technology Group Co., Ltd.,Beijing BOE Optoelectronics Technology Co., Ltd.
- Current Assignee Address: CN Beijing CN Beijing
- Agency: Collard & Roe, P.C.
- Priority: CN201310311665 20130723
- International Application: PCT/CN2013/088839 WO 20131209
- International Announcement: WO2015/010416 WO 20150129
- Main IPC: H01L27/12
- IPC: H01L27/12 ; H01L21/3065 ; H01L21/311 ; G02F1/1339

Abstract:
An array substrate and a manufacturing method thereof as well as a display panel are provided. The manufacturing method comprises: forming a pattern including a scanning line (32) and a spacer base (33) on a same layer of a substrate (31); forming a gate insulating layer (34); forming a pattern including an active layer (35), a data line, a source electrode and a drain electrode; forming a passivation layer (36); sequentially etching the passivation layer (36) and the gate insulating layer (34) through a dry etching method to form a via hole (38) exposing the spacer base (33), and inducing materials generated from an etching process in a reaction cavity to deposit on a surface of the spacer base (33) through an electric field formed by the spacer base (33) exposed in the via hole (38) and etching gas adopted in the etching process, to form a spacer (39).
Public/Granted literature
- US20150325591A1 ARRAY SUBSTRATE AND MANUFACTURING METHOD THEREOF AS WELL AS DISPLAY PANEL Public/Granted day:2015-11-12
Information query
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