Invention Grant
- Patent Title: Ophthalmic apparatus, and treatment site measuring method for the apparatus
- Patent Title (中): 眼科仪器和设备的治疗部位测量方法
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Application No.: US14414700Application Date: 2013-07-15
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Publication No.: US09301681B2Publication Date: 2016-04-05
- Inventor: Tae Ho Ha , Ki Chan Kim
- Applicant: LUTRONIC CORPORATION
- Applicant Address: KR Goyang
- Assignee: LUTRONIC CORPORATION
- Current Assignee: LUTRONIC CORPORATION
- Current Assignee Address: KR Goyang
- Priority: KR10-2012-0076782 20120713
- International Application: PCT/KR2013/006326 WO 20130715
- International Announcement: WO2014/011014 WO 20140116
- Main IPC: A61B3/10
- IPC: A61B3/10 ; A61B3/12 ; A61B3/00 ; A61B3/14 ; G06T7/00
Abstract:
The present invention relates to an ophthalmic apparatus and to a treatment site measuring method for the apparatus. The ophthalmic apparatus according to the present invention comprises: a first image unit for capturing the lower region of a retina so as to generate an image of the captured retina; a second image unit for capturing the local region of the retina indicated by a surgical operator so as to generate an image of the captured local region of the retina; and a control unit for mapping the image of the local region of the retina generated by the second image unit to the image of the retina generated by the first image unit based on the image of the retina generated by the first image unit.
Public/Granted literature
- US20150173611A1 OPHTHALMIC APPARATUS, AND TREATMENT SITE MEASURING METHOD FOR THE APPARATUS Public/Granted day:2015-06-25
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