Invention Grant
- Patent Title: Extruder system and method for treatment of a gaseous medium
- Patent Title (中): 挤出机系统和处理气体介质的方法
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Application No.: US14078815Application Date: 2013-11-13
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Publication No.: US09302220B2Publication Date: 2016-04-05
- Inventor: Norberto Silvi , Robert James Perry , Surinder Prabhjot Singh , Gary Stephen Balch , Tiffany Elizabeth Pinard Westendorf
- Applicant: General Electric Company
- Applicant Address: US NY Niskayuna
- Assignee: General Electric Company
- Current Assignee: General Electric Company
- Current Assignee Address: US NY Niskayuna
- Agent Francis T. Coppa
- Main IPC: B01D53/06
- IPC: B01D53/06 ; B01D53/08 ; B01D53/18 ; B01D53/73 ; B01D53/78 ; B01D53/80 ; B01D53/83 ; B01D53/96 ; B01D53/14 ; B01D53/62

Abstract:
A system for treatment of a gaseous medium, comprises an extruder having a barrel. The extruder further comprises a first inlet port, a second inlet port, and a plurality of outlet ports coupled to the barrel. The first inlet port is configured for feeding a lean sorbent, the second inlet port is configured for feeding a gaseous medium, and the plurality of outlet ports are configured for releasing a plurality of components removed from the gaseous medium. Further, the extruder comprises a plurality of helical elements coupled to a plurality of kneading elements, mounted on a shaft, and disposed within the barrel. The barrel and the plurality of helical and kneading elements together form an absorption unit and a desorption unit. The first and second inlet ports are formed in the absorption unit and the plurality of outlet ports are formed in the absorption and desorption units.
Public/Granted literature
- US20150132204A1 EXTRUDER SYSTEM AND METHOD FOR TREATMENT OF A GASEOUS MEDIUM Public/Granted day:2015-05-14
Information query
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