Invention Grant
- Patent Title: Method of producing flow channel device, and flow channel device
- Patent Title (中): 生产流道装置及流道装置的方法
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Application No.: US14227713Application Date: 2014-03-27
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Publication No.: US09303796B2Publication Date: 2016-04-05
- Inventor: Yoichi Katsumoto
- Applicant: Sony Corporation
- Applicant Address: JP Tokyo
- Assignee: Sony Corporation
- Current Assignee: Sony Corporation
- Current Assignee Address: JP Tokyo
- Agency: K&L Gates LLP
- Priority: JP2013-084382 20130412
- Main IPC: B32B37/00
- IPC: B32B37/00 ; B29C65/00 ; F16L11/04 ; B01L3/00 ; B32B27/28 ; B32B15/08 ; B32B15/20 ; B32B27/08 ; B32B3/08 ; B32B3/10 ; B29C47/06

Abstract:
There is provided a method of producing a fluid channel device including laminating a plurality of polyimide films including at least one polyimide film having a port and at least one polyimide film having a channel, the polyimide films including at least one thermoplastic polyimide film; and adhering a plurality of the polyimide films by applying heat such that the ports are communicated with the channels. There is also provided the flow channel device produced by the method.
Public/Granted literature
- US20140305533A1 METHOD OF PRODUCING FLOW CHANNEL DEVICE, AND FLOW CHANNEL DEVICE Public/Granted day:2014-10-16
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