Invention Grant
US09303975B2 Method for determining the registration of a structure on a photomask and apparatus to perform the method
有权
用于确定光掩模上的结构的配准和执行该方法的装置的方法
- Patent Title: Method for determining the registration of a structure on a photomask and apparatus to perform the method
- Patent Title (中): 用于确定光掩模上的结构的配准和执行该方法的装置的方法
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Application No.: US13229396Application Date: 2011-09-09
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Publication No.: US09303975B2Publication Date: 2016-04-05
- Inventor: Michael Arnz , Dirk Seidel , Gerd Klose
- Applicant: Michael Arnz , Dirk Seidel , Gerd Klose
- Applicant Address: DE Oberkochen DE Jena DE Jena
- Assignee: Carl Zeiss SMT GmbH,Carl Zeiss SMS GmbH,Carl Zeiss Meditec AG
- Current Assignee: Carl Zeiss SMT GmbH,Carl Zeiss SMS GmbH,Carl Zeiss Meditec AG
- Current Assignee Address: DE Oberkochen DE Jena DE Jena
- Agency: Fish & Richardson P.C.
- Priority: DE102010045135 20100910
- Main IPC: G01B11/00
- IPC: G01B11/00 ; G03F1/42 ; G03F1/84
Abstract:
A method for determining a registration error of a feature on a mask, including providing a first aerial image that was captured by means of a position measuring device and includes at least the feature, simulating, from pattern specifications of the mask, a second aerial image that includes at least the feature, taking into account at least one effect that causes distortion of the first aerial image, and determining the registration error of the feature as the distance of the position of the feature in the first aerial image from the position of the feature in the second aerial image. Also provided is a method for simulating an aerial image from pattern specifications of a mask and a position measuring device for carrying out the method.
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