Invention Grant
- Patent Title: Light exposure apparatus and method of controlling the same
- Patent Title (中): 曝光装置及其控制方法
-
Application No.: US13428961Application Date: 2012-03-23
-
Publication No.: US09304402B2Publication Date: 2016-04-05
- Inventor: Tsunemitsu Torigoe , Hong Suk Yoo , Chang Hoon Kim
- Applicant: Tsunemitsu Torigoe , Hong Suk Yoo , Chang Hoon Kim
- Applicant Address: KR Yongin-si
- Assignee: Samsung Display Co., Ltd.
- Current Assignee: Samsung Display Co., Ltd.
- Current Assignee Address: KR Yongin-si
- Agency: H.C. Park & Associates, PLC
- Priority: KR10-2011-0072540 20110721
- Main IPC: G03F7/20
- IPC: G03F7/20
Abstract:
The present invention relates to a method of controlling a light exposure apparatus including an exposure beam generator equipped with a prism or a bend mirror and a vacuum chamber through which light generated in the exposure beam generator passes. The method includes, generating an exposure beam; measuring a deviation of a center of the exposure beam from a reference line in the vacuum chamber; and adjusting the prism or the bend mirror in the exposure beam generator to adjust the center of the exposure beam when the center of the exposure beam is misaligned with the reference line.
Public/Granted literature
- US20130021590A1 LIGHT EXPOSURE APPARATUS AND METHOD OF CONTROLLING THE SAME Public/Granted day:2013-01-24
Information query
IPC分类:
