Invention Grant
- Patent Title: Apparatus and method of direct writing with photons beyond the diffraction limit
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Application No.: US14143139Application Date: 2013-12-30
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Publication No.: US09304410B2Publication Date: 2016-04-05
- Inventor: David A. Markle , Rudolf H. Hendel , John S. Petersen , Hwan J. Jeong
- Applicant: David A. Markle , Rudolf H. Hendel , John S. Petersen , Hwan J. Jeong
- Applicant Address: US CA Los Gatos
- Assignee: Periodic Structures Inc.
- Current Assignee: Periodic Structures Inc.
- Current Assignee Address: US CA Los Gatos
- Agency: Opticus IP Law PLLC
- Main IPC: G03B27/32
- IPC: G03B27/32 ; G03B27/54 ; G03C5/00 ; G03F7/20

Abstract:
Direct-write lithography apparatus and methods are disclosed in which a transducer image and an image of crossed interference fringe patterns are superimposed on a photoresist layer supported by a substrate. The transducer image has an exposure wavelength and contains bright spots, each corresponding to an activated pixel. The interference image has an inhibition wavelength and contains dark spots where the null points in the crossed interference fringes coincide. The dark spots are aligned with and trim the peripheries of the corresponding bright spot to form sub-resolution photoresist pixels having a size smaller than would be formed in the absence of the dark spots.
Public/Granted literature
- US20150331330A1 Apparatus and method of direct writing with photons beyond the diffraction limit Public/Granted day:2015-11-19
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