Invention Grant
- Patent Title: Marking apparatus and marking method
- Patent Title (中): 标记设备和标记方法
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Application No.: US14482520Application Date: 2014-09-10
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Publication No.: US09305743B2Publication Date: 2016-04-05
- Inventor: Takehiro Nakai , Hideki Shuto
- Applicant: KABUSHIKI KAISHA TOSHIBA
- Applicant Address: JP Minato-ku
- Assignee: KABUSHIKI KAISHA TOSHIBA
- Current Assignee: KABUSHIKI KAISHA TOSHIBA
- Current Assignee Address: JP Minato-ku
- Agency: Oblon, McClelland, Maier & Neustadt, L.L.P.
- Main IPC: B25H7/04
- IPC: B25H7/04 ; B25H7/00 ; H01J37/22

Abstract:
In accordance with an embodiment, a marking apparatus includes a charged particle beam device and a marking unit. The charged particle beam device generates a charged particle beam, irradiates a sample including a laminated body with the charged particle beam, detects secondary charged particles generated from the sample, and acquires a sample image. The marking unit bores a hole reaching at least a second layer from a surface layer in the laminated body in a viewing field of the charged particle beam device.
Public/Granted literature
- US20150262786A1 MARKING APPARATUS AND MARKING METHOD Public/Granted day:2015-09-17
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