Invention Grant
US09305749B2 Methods of directing magnetic fields in a plasma source, and associated systems
有权
在等离子体源和相关系统中引导磁场的方法
- Patent Title: Methods of directing magnetic fields in a plasma source, and associated systems
- Patent Title (中): 在等离子体源和相关系统中引导磁场的方法
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Application No.: US14600397Application Date: 2015-01-20
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Publication No.: US09305749B2Publication Date: 2016-04-05
- Inventor: Zheng John Ye , Jay D. Pinson, II , Hiroji Hanawa , Juan Carlos Rocha-Alvarez
- Applicant: Applied Materials, Inc.
- Applicant Address: US CA Santa Clara
- Assignee: Applied Materials, Inc.
- Current Assignee: Applied Materials, Inc.
- Current Assignee Address: US CA Santa Clara
- Agency: Kilpatrick Townsend & Stockton LLP
- Main IPC: H05B37/02
- IPC: H05B37/02 ; H01J37/32

Abstract:
A plasma source includes a plasma vessel that includes a dielectric material that encloses a cavity of a toroidal shape. The toroidal shape defines a toroidal axis therethrough. The vessel forms input and output connections, each of the input and output connections being in fluid communication with the cavity. One or more metal plates are disposed adjacent to the plasma vessel for cooling the plasma vessel. A magnetic core is disposed along the toroidal axis such that respective first and second ends of the magnetic core extend beyond axially opposed sides of the plasma vessel. First and second induction coils are wound about the respective first and second ends of the magnetic core. A plasma is generated in the cavity when an input gas is supplied through the input connection and an oscillating electrical current is supplied to the first and second induction coils.
Public/Granted literature
- US20150228456A1 METHODS OF DIRECTING MAGNETIC FIELDS IN A PLASMA SOURCE, AND ASSOCIATED SYSTEMS Public/Granted day:2015-08-13
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